SKPT 晶圓清洗機|WS300 系列產品介紹
WS300 series wafer cleaning system can clean all of semiconductor products, especially after dicing process.
End user can use multi cleaning sequences to keep the stability and productivity.
And choose the option – contact cleaning arm to improve the quality.

- Fully Auto / Semi Auto
- Atomizing cleaning nozzle
- Customization C/T (Max size: 400 x 400 mm)
- 10 Recipes Memory
- FOUP / FOSB Load Port (Option)
- HEPA Filter (Option)
- Coating Function (Option)
- Frame Scan (Fully Auto Supported)
WS300 系列晶圓/晶片清洗機採全自動或半自動模式來清洗切割後的產品,可⾃⾏設定所需的清洗程序來維持穩定的清洗品質及效率。
除了可使用水氣二流體噴嘴,也可選配毛刷或海綿來提升清潔效果與品質。亦可依客戶需求客製特殊清洗模式,如 Wafer 邊緣清洗、裸片清洗、表面塗佈(Spin coating)等。
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